Could diffractive optics be a decent alternative to reflective optics for EUV lithography?
It has the same advantage of not needing a refractive material that works with EUV, but you can stick with optics that are 'inline'.
I guess the exposure just isn't going to be strong-enough because the actual aperture is just to small?
I guess the exposure just isn't going to be strong-enough because the actual aperture is just to small?