This is neither low cost nor commercially relevant. It’s an exotic, low-temperature (so incompatible with subsequent steps of most wafer processes) deposition of rare earth material. The lasing wavelength is all wrong (1.9 um). It requires a pump laser in the 1.6 um range which is the usual range of interest. The efficiency is not very good. Couldn’t find the linewidth while scanning rapidly. It’s a run of the mill academic paper.
There exist commercial electrically pumped lasers on silicon that are being continuously improved through different approaches. Intel is one of the leaders on that.
There exist commercial electrically pumped lasers on silicon that are being continuously improved through different approaches. Intel is one of the leaders on that.