As he says here, the decision not to take risk and jump to EUV with TSMC and Samsung was the mistake that started this downfall and it snowballed. The decision happened somewhere in the pathfinding stage into 10nm.
When Gerald Marcyk was running Intel components research back in the
2001 Intel was already considering using EUV lithography for the 45nm technology node that would come out 2007. It turned out that the switch to EUV could be delayed and delayed again. Intel thought they could get away with it this last time and it was a wrong decision.
Intel, Samsung and TSMC invested billions into ASML in 2012. In exchange Intel got 15% ownership, Samsung 10% and TSML 5% if I remember correctly.
They don't have any significant ownership anymore.
When Gerald Marcyk was running Intel components research back in the 2001 Intel was already considering using EUV lithography for the 45nm technology node that would come out 2007. It turned out that the switch to EUV could be delayed and delayed again. Intel thought they could get away with it this last time and it was a wrong decision.
EUV is super hard. There is only one company that can make EUV lithography machines, Dutch company called ASML. TWINSCAN NXE:3400B costs ~$120 million https://www.asml.com/en/products/euv-lithography-systems/twi...
Intel, Samsung and TSMC invested billions into ASML in 2012. In exchange Intel got 15% ownership, Samsung 10% and TSML 5% if I remember correctly. They don't have any significant ownership anymore.