Most chips made today are created with multipatterning processes using 193nm lasers and optical masks, known in the field as "Deep Ultraviolet Lithography" (DUV(L)). The industry is pushing towards replacing DUV (which has been pushed to its extremes) with "Extreme Ultraviolet Lithography" (EUV(L)), which uses a 13.5 nm light source (just watch https://www.youtube.com/watch?v=5yTARacBxHI - it's both fascinating and terrifying the trouble that EUV brings) and mirrors since pretty much all matter is opaque to EUV light.
It's a bit maddening to think that features that much smaller than the wavelength of light used can be patterned with that light source, but we've made a science out of it over the past decade with multipatterning and immersion lithography.
Most chips made today are created with multipatterning processes using 193nm lasers and optical masks, known in the field as "Deep Ultraviolet Lithography" (DUV(L)). The industry is pushing towards replacing DUV (which has been pushed to its extremes) with "Extreme Ultraviolet Lithography" (EUV(L)), which uses a 13.5 nm light source (just watch https://www.youtube.com/watch?v=5yTARacBxHI - it's both fascinating and terrifying the trouble that EUV brings) and mirrors since pretty much all matter is opaque to EUV light.
It's a bit maddening to think that features that much smaller than the wavelength of light used can be patterned with that light source, but we've made a science out of it over the past decade with multipatterning and immersion lithography.